Spin Coater

What is Spin Coater?

Spin Coater (Rotary Coating Device) is a laboratory equipment used in the production of thin film coatings and coating layers. It is generally used in the production of semiconductor devices, solar cells, sensors and microelectronic components. This device applies a solution or liquid layer to the sample surface, allowing thin films to be formed homogeneously and in certain thicknesses.

Working Principle (Rotary Coating Device)

The basic working principle of Spin Coater can be summarized with the following steps:

Solution Preparation: The solution of the materials required to form the thin film is prepared. This solution may contain special components dissolved in a solvent. These components will eventually ensure the formation of the thin film.

Substrate Preparation: The substrate on which the thin film layer will be applied is usually a flat and clean surface such as silicon or glass. The thin film will be formed on this substrate.

Solution Application: The solution is applied to the substrate. This process usually begins by placing a drop in the center of the solution.

Rotation Process: The solution layer applied to the substrate is rotated by the spin coater’s plate. The rotation speed is a critical parameter affecting the thickness of the thin film to be formed. The rotation process on the plate allows the solution to spread along its surface.

-Centrifugal Force Effect: The rotation on the plate creates a solution layer that spreads from the center outwards. This solution layer becomes thinner depending on the effect of gravity and the rotation speed.

-Drying Process: After the rotation process is over, the solution layer is spread on the substrate. However, the layer is still wet. Therefore, the layer is dried by methods such as hot air or infrared light. This step ensures that the thin film coating takes its final form.

Spin Coater Applications and Importance

The spin coater is used in microelectronics production, semiconductor device production, sensor technology, nanotechnology, biomedical field and many other fields. This device enables the controllable production of thin film coatings, which forms the basis of many technological applications.

As a result, the spin coater is a critical tool for the production of thin-film coatings. Particularly in the fields of microelectronics and nanotechnology, the high control and uniformity provided by the device enables the development of advanced technologies.

Spin Coater Apogee 450 (Spin Coater)

ROTARY COATER BENEFITS

Compact design for reduced footprint
Full-color, 7-inch touchscreen display
Highest horsepower drive system in its class (indirect)
Advanced lid lift assist feature (gas spring opens ≥ 45°)
Durable benchtop design
DataStream™ technology
Optional X-PRO workstation integrates standalone cabinet with top exhaust wall for process fume control.

CHAMBER DESIGN

High-density polyethylene (HDPE) spin bowl
Versatile lid design provides process flexibility and repeatability
Optional nitrogen purge for inert spin environment
Integrated purge and exhaust ports