× HYDROTHERMAL SYSTEM SPIN COATER SC-X20 WAVELENGTH DEPENDENT LED PHOTOCATALYTIC SYSTEM PHOTOSYNTHETICALLY ACTIVE RADIATION SYSTEM HYPERTHERMIA THERAPY SYSTEM PROBE STATION PROBE HOLDER HIGH TEMPERATURE FURNACE CURRENT-VOLTAGE TESTER UNDER VARIOUS TEMPERATURES PHOTODEVICE CHARACTERIZATION SYSTEM TRIBOMETER AAA CLASS LED SOLAR SIMULATOR 9830 EPD COATING SYSTEM PHOTORESPONSE SYSTEM SOLAR PANEL SOLAR SIMULATOR ELECTROSPINNING SYSTEM ESP 9300 AAA CLASS SOLAR SIMULATOR FYTRONIX-9860 XENON LIGHT SOURCE CYCLIC VOLTAMETRY ELECTRODES 9000-HOT PRESS 9000-HOT PRESS 2 PHOTOCONDUCTIVITY – TIME MEASUREMENT SYSTEM LED QUANTUM EFFICIENCY SYSTEM FY-MGSP-3 2 RF + 1 DC MAGNETRON SPUTTERING SYSTEM FYT-T1800 1800C HIGH TEMPERATURE TUBE FURNACE UV CURABLE EPD COATING SYSTEM ULTRASONIC SPRAY COATING SYSTEM ULTRASONIC SONICATOR SPARK PLASMA SYSTEM SOL GEL THIN FILM COATER SILAR QUANTUM DOTS COATER REFERENCE SOLAR CELL CERTIFICATE REFERECE SOLAR CELL QUANTUM EFFICIENCY SYSTEM PHOTORESPONSE AND PHOTOCAPACITANCE ANALYZER PHOTOCHEMICAL SYSTEM PHOTOCATALYSIS SYSTEM PHOTOCATALYSIS SOLAR SIMULATOR OPTICAL CONSTANTS CHARACTERIATION SYSTEM OLED CHARACTERIZATION SYSTEM OFET CHARACTERIZATION SYSTEM FULL AUTOMATIC SOLAR SIMULATOR MICROMETER ADJUSTABLE THIN FILM COATER DOCTOR BLADE MARKSTRONIC AAA CLASS LED SOLAR SIMULATOR MAGNETIC FIELD ASSISTED ELECTROSPINNING IMPEDANCE ANALYZER LCR METER IMPEDANCE ANALYZER HIGH PRESSURE REACTOR SYSTEM HALL EFFECT MEASUREMENT SYSTEM GLOVEBOX SYSTEM GAS SENSOR MEASUREMENT SYSTEM UV DEZENFEKTE CİHAZI SPIN COATER HYDROTHERMAL SYSTEM EPD COATING SYSTEM ELECTROSPINNING SYSTEM 9800 AAA CLASS SOLAR SIMULATOR 9600 AAA CLASS SOLAR SIMULATOR FULL AUTOMATIC SOLAR IV – IMPEDANCE ANALYZER SYSTEM FOUR PROBE CONDUCTIVITY METER FOUR POINT PROBE RESISTANCE SYSTEM ELEKTROSPINNING MACHINE ELECTROSPINNING MACHINE/NANOFIBER ELECTROPHORETIC DEPOSITION (EPD) ELECTRICAL CONDUCTIVITY SYSTEM DYE SENSITIZED SOLAR CELL HOLDER DIP COATER DIELECTRIC MEASUREMENT SYSTEM DIELECTRIC ANALYZER CURRENT AND VOLTAGE MODULATED SYSTEM CONTACT ANGLE TESTER CHEMOTHERAPY OF CANCER 9000 CHEMICAL BATH DEPOSITION CAPACITANCE-VOLTAGE ANALYZER BATTERY CHARGE - DISCHARGE ANALZYER AGATE MORTAR FOR GRINDING AAA CLASS SOLAR SIMULATOR IV CHARATERIZATION SYSTEM 9900 AAA CLASS LED SOLAR SIMULATOR 9800 300 W AAA CLASS SOLAR SIMULATOR 300 W-80 AAA CLASS SOLAR SIMULATOR 300 W-50 AAA CLASS SOLAR SIMULATOR ELEKTROSPINNING NANOFIBER SPIN COATERS - PHOTOLITHOGRAPHY SPIN COATER SOURCE MEASURE UNIT SYSTEM I-V MEASURE SOURCE METER IV AND CV ANALYZER SOLAR SIMULATOR- AAA CLASS SOLAR SIMULATOR SOLAR SIMULATOR AAA CLASS CRYOSTAT ULTRASONIC CLEANING BATH THIN FILM TRANSISTOR CHARACTERIZATION SYSTEM ULTRASONIC SONICATOR 2 HYDROTHERMAL REACTOR/HIGH PRESSURE REACTOR HIGH VOLTAGE POWER SUPPLY HYDROTHERMAL SYSTEM HIGH TEMPERATURE FURNACE FOUR POINT PROBE SCS SEMICONDUCTOR CHARACTERIZATION SYSTEM ELECTRICAL CONDUCTIVITY ANALYZER OPEN SYSTEM NITROGEN CRYOSTAT DC GÜÇ KAYNAĞI 12V/8A THERMAL EVAPORATION AND MAGNETRON SPUTTER SYSTEM WITH OPTIONAL GLOVEBOX INTEGRATION THERMAL ANALYSIS CRUCIBLE CERAMIC ITCH METTLER ALUMINA/TG/DIFFERENTIAL HEAT DSC TGA/DTA

Spin Coater

What is Spin Coater?

Spin Coater (Rotary Coating Device) is a laboratory equipment used in the production of thin film coatings and coating layers. It is generally used in the production of semiconductor devices, solar cells, sensors and microelectronic components. This device applies a solution or liquid layer to the sample surface, allowing thin films to be formed homogeneously and in certain thicknesses.

Working Principle (Rotary Coating Device)

The basic working principle of Spin Coater can be summarized with the following steps:

Solution Preparation: The solution of the materials required to form the thin film is prepared. This solution may contain special components dissolved in a solvent. These components will eventually ensure the formation of the thin film.

Substrate Preparation: The substrate on which the thin film layer will be applied is usually a flat and clean surface such as silicon or glass. The thin film will be formed on this substrate.

Solution Application: The solution is applied to the substrate. This process usually begins by placing a drop in the center of the solution.

Rotation Process: The solution layer applied to the substrate is rotated by the spin coater’s plate. The rotation speed is a critical parameter affecting the thickness of the thin film to be formed. The rotation process on the plate allows the solution to spread along its surface.

-Centrifugal Force Effect: The rotation on the plate creates a solution layer that spreads from the center outwards. This solution layer becomes thinner depending on the effect of gravity and the rotation speed.

-Drying Process: After the rotation process is over, the solution layer is spread on the substrate. However, the layer is still wet. Therefore, the layer is dried by methods such as hot air or infrared light. This step ensures that the thin film coating takes its final form.

Spin Coater Applications and Importance

The spin coater is used in microelectronics production, semiconductor device production, sensor technology, nanotechnology, biomedical field and many other fields. This device enables the controllable production of thin film coatings, which forms the basis of many technological applications.

As a result, the spin coater is a critical tool for the production of thin-film coatings. Particularly in the fields of microelectronics and nanotechnology, the high control and uniformity provided by the device enables the development of advanced technologies.

Spin Coater Apogee 450 (Spin Coater)

ROTARY COATER BENEFITS

Compact design for reduced footprint
Full-color, 7-inch touchscreen display
Highest horsepower drive system in its class (indirect)
Advanced lid lift assist feature (gas spring opens ≥ 45°)
Durable benchtop design
DataStream™ technology
Optional X-PRO workstation integrates standalone cabinet with top exhaust wall for process fume control.

CHAMBER DESIGN

High-density polyethylene (HDPE) spin bowl
Versatile lid design provides process flexibility and repeatability
Optional nitrogen purge for inert spin environment
Integrated purge and exhaust ports

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